An Experimental and Computer Simulation Study of the Process of Buried SiO Layer Formation After Oxygen Ion Implantation into Silicon
Publication in refereed journal


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All Author(s) ListWILSON Ian Howard, R.A. Yankov, I.R. Chakarov
Journal nameRadiation Effects
Year1990
Issue Number115
Pages157
LanguagesEnglish-United Kingdom
KeywordsBURIED SiO__2 ; ION IMPLANTATION ; SYNTHESIS

Last updated on 2018-24-01 at 17:37