Control of polariton patterns in semiconductor microcavities
Refereed conference paper presented and published in conference proceedings

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AbstractPolaritons in semiconductor microcavities can form patterns analogous to conventional Turing patterns, including two-spot and hexagon far field patterns. We present theoretical concepts of pattern formation and control, together with experimental observations.
All Author(s) ListTse Y.C., Lewandowski P., Ardizzone V., Kwong N.H., Luk M.H., Lucke A., Abbarchi M., Bloch J., Baudin E., Galopin E., Lemaitre A., Tsang C.Y., Chan K.P., Leung P.T., Roussignol P., Binder R., Tignon J., Schumacher S.
LanguagesEnglish-United Kingdom

Last updated on 2020-05-09 at 02:19