Triple patterning lithography aware optimization for standard cell based design
Refereed conference paper presented and published in conference proceedings

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AbstractTriple Patterning Lithography (TPL) is regarded as a promising technique to handle the manufacturing challenges in 14nm and beyond technology node. It is necessary to consider TPL in early design stages to make the layout more TPL friendly and reduce the manufacturing cost. In this paper, we propose a flow to co-optimize cell layout decomposition and detailed placement. Our cell decomposition approach can enumerate all coloring solutions with the minimum number of stitches. Experimental results show that our approach can outperform the existing work in all aspects of stitch number, HPWL and running time.
All Author(s) ListKuang J., Chow W.-K., Young E.F.Y.
Name of Conference2014 33rd IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2014
Start Date of Conference02/11/2014
End Date of Conference06/11/2014
Place of ConferenceSan Jose
Country/Region of ConferenceUnited States of America
Detailed descriptionorganized by IEEE,
Volume Number2015-January
Issue NumberJanuary
Pages108 - 115
LanguagesEnglish-United Kingdom

Last updated on 2020-04-08 at 03:01