A robust approach for process variation aware mask optimization
Refereed conference paper presented and published in conference proceedings


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AbstractAs the minimum feature size continues to shrink, whereas the wavelength of light used for lithography remains constant, Resolution Enhancement Techniques are widely used to optimize mask, so as to improve the subwavelength printability. Besides correcting for error between the printed image and target shape, a mask optimization method also needs to consider process variation. In this paper, a robust mask optimization approach is proposed to optimize the process window as well as the Edge Placement Error (EPE) of the printed image. Experiments results on the public benchmarks are encouraging.
All Author(s) ListKuang J., Chow W.-K., Young E.F.Y.
Name of Conference2015 Design, Automation and Test in Europe Conference and Exhibition, DATE 2015
Start Date of Conference09/03/2015
End Date of Conference13/03/2015
Place of ConferenceGrenoble
Country/Region of ConferenceFrance
Detailed descriptionorganized by IEEE,
Year2015
Month1
Day1
Volume Number2015-April
Pages1591 - 1594
ISBN9783981537048
ISSN1530-1591
LanguagesEnglish-United Kingdom

Last updated on 2020-23-05 at 00:30