Copper phthalocyanine film grown by vacuum deposition under magnetic field
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AbstractCopper phthalocyanine (CuPc) film with good orientation is always required when CuPc is to be used as an electronic functional layer in different device applications. In the present study, a magnetic field (similar to 6 mT) was applied during the vacuum deposition of CuPc. The CuPc film grown under such a magnetic field showed better orientation and a new stacking behavior as shown by X-ray diffraction study (XRD) and atomic force microscopy (AFM). In addition, the film grown under magnetic field exhibited different absorption characteristics in the UV-visible range. This demonstrates the potential of using magnetic field to optimize the growth of CuPc for various applications. (C) 2002 Elsevier Science B.V. All rights reserved.
All Author(s) ListJi ZG, Wong KW, Tse PK, Kwok RWM, Lau WM
Journal nameThin Solid Films
Volume Number402
Issue Number1-2
Pages79 - 82
LanguagesEnglish-United Kingdom
Keywordsatomic force microscopy (AFM); deposition process; organic semiconductors; surface morphology; X-ray diffraction (XRD)
Web of Science Subject CategoriesMaterials Science; Materials Science, Coatings & Films; MATERIALS SCIENCE, COATINGS & FILMS; Materials Science, Multidisciplinary; MATERIALS SCIENCE, MULTIDISCIPLINARY; Physics; Physics, Applied; PHYSICS, APPLIED; Physics, Condensed Matter; PHYSICS, CONDENSED MATTER

Last updated on 2020-12-08 at 01:27