Breaking the Resolution versus Throughput Tradeoff In Nanoscale Additive Manufacturing
Refereed conference paper presented and published in conference proceedings


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摘要Two-photon lithography (TPL) is a promising additive manufacturing technique for fabrication of millimeter scale complex 3D structures with nanoscale features [1-12]. TPL relies on nonlinear two-photon absorption to generate features smaller than the diffraction-limited focused light spot. This unique capability of TPL has been leveraged in diverse fields to fabricate functional micro- and nanoscale 3D structures, such as photonic crystals, optical and mechanical metamaterials, micromachines, miniaturized optics, and flexible electronics. Unfortunately, the practical import of TPL is limited by the tradeoff that exists between feature resolution and throughput.

The most common implementation of TPL involves serially scanning a tightly focused laser spot in a photopolymer resist to fabricate 3D structures by overlapping the individual submicron volumetric pixels (i.e., voxels) that are generated in the focal volume. The serial and slow writing scheme of these existing TPL implementations makes production scaleup beyond one-off demonstrations impractical. Due to the challenging ultrafast light-matter interactions that underlie TPL, past attempts at parallelization have either compromised its submicron resolution or its ability to pattern complex structures. As a result, TPL has remained a niche fabrication technique with limited adoption beyond academic and research laboratories. Here, we present a parallel TPL process based on femtosecond projection that increases the rate of 3D printing by two to three orders of magnitude without compromising the submicron resolution. In addition, our technique allows one to access previously unexplorable geometric design space by enabling the printing of thinnest-ever nanowires at widths smaller than 175 nm along all cross-sectional axes, over an area a million times larger than the nanowire’s cross-sectional area, and within single-digit millisecond time scales. This transforms TPL from an expensive niche technique to a widely applicable cost-effective high-throughput high-resolution 3D printing process.
出版社接受日期01.08.2019
著者Vu H. Nguyen, Dien Wang, James S. Oakdale, Shih-Chi Chen, Sourabh K. Saha
會議名稱Annual Meeting of the American Society for Precision Engineering
會議開始日28.10.2019
會議完結日01.11.2019
會議地點Pittsburg, PA
會議國家/地區美國
會議論文集題名Proceedings of the 34th ASPE Annual Meeting
出版年份2019
月份10
出版社ASPE
出版地USA
頁次18 - 21
國際標準書號978-188770678-0
語言美式英語
關鍵詞two-photon polymerization, temporal focusing

上次更新時間 2020-02-09 於 01:39