Breaking the Resolution versus Throughput Tradeoff In Nanoscale Additive Manufacturing
Refereed conference paper presented and published in conference proceedings


Full Text

Times Cited

Other information
AbstractTwo-photon lithography (TPL) is a promising additive manufacturing technique for fabrication of millimeter scale complex 3D structures with nanoscale features [1-12]. TPL relies on nonlinear two-photon absorption to generate features smaller than the diffraction-limited focused light spot. This unique capability of TPL has been leveraged in diverse fields to fabricate functional micro- and nanoscale 3D structures, such as photonic crystals, optical and mechanical metamaterials, micromachines, miniaturized optics, and flexible electronics. Unfortunately, the practical import of TPL is limited by the tradeoff that exists between feature resolution and throughput.

The most common implementation of TPL involves serially scanning a tightly focused laser spot in a photopolymer resist to fabricate 3D structures by overlapping the individual submicron volumetric pixels (i.e., voxels) that are generated in the focal volume. The serial and slow writing scheme of these existing TPL implementations makes production scaleup beyond one-off demonstrations impractical. Due to the challenging ultrafast light-matter interactions that underlie TPL, past attempts at parallelization have either compromised its submicron resolution or its ability to pattern complex structures. As a result, TPL has remained a niche fabrication technique with limited adoption beyond academic and research laboratories. Here, we present a parallel TPL process based on femtosecond projection that increases the rate of 3D printing by two to three orders of magnitude without compromising the submicron resolution. In addition, our technique allows one to access previously unexplorable geometric design space by enabling the printing of thinnest-ever nanowires at widths smaller than 175 nm along all cross-sectional axes, over an area a million times larger than the nanowire’s cross-sectional area, and within single-digit millisecond time scales. This transforms TPL from an expensive niche technique to a widely applicable cost-effective high-throughput high-resolution 3D printing process.
Acceptance Date01/08/2019
All Author(s) ListVu H. Nguyen, Dien Wang, James S. Oakdale, Shih-Chi Chen, Sourabh K. Saha
Name of ConferenceAnnual Meeting of the American Society for Precision Engineering
Start Date of Conference28/10/2019
End Date of Conference01/11/2019
Place of ConferencePittsburg, PA
Country/Region of ConferenceUnited States of America
Proceedings TitleProceedings of the 34th ASPE Annual Meeting
Year2019
Month10
PublisherASPE
Place of PublicationUSA
Pages18 - 21
ISBN978-188770678-0
LanguagesEnglish-United States
Keywordstwo-photon polymerization, temporal focusing

Last updated on 2020-02-09 at 01:39